Organometallic precursors enable the targeted development of functional metal layers for industrial applications. The focus is on understanding process-structure-property relationships in order to optimize surfaces and tools in a targeted manner and to translate new coating systems into practical applications. In this way, they make an important contribution to the development of high-performance and cost-effective coating solutions.

Molybdenum hexacarbonyl and tungsten hexacarbonyl are high-purity organometallic compounds (99.9% purity) used as precursors in CVD and ALD processes. Due to their defined thermal decomposition, they enable the reproducible deposition of molybdenum and tungsten layers with controlled film thickness, high density, and homogeneous composition.

Thin functional coatings make it possible to tailor the properties of tool surfaces specifically to the application at hand. Metallic coating systems based on molybdenum or tungsten are used to increase wear resistance, improve temperature stability, and serve as diffusion barriers. The goal of the development of functional coatings by the non-profit KIMW Forschungs-GmbH is to increase service life, make processes more stable, and open up new fields of application for tools.

It is used in thermally activated gas-phase processes such as chemical vapor deposition (CVD). These processes enable conformal coating even on complex geometries and internal structures, making them particularly important for demanding tooling applications.

By combining state-of-the-art plant technology, analytical methods, and process expertise, KIMW Forschungs-GmbH is able to develop and evaluate coating systems in a targeted manner. Companies benefit from:

• reliable data on coating performance
• optimized process parameters
• shorter development times
• scalable solutions for industrial manufacturing

In this way, research conducted in-house is effectively translated into applicable technologies.

Coatings based on these metals exhibit high thermal stability, good mechanical strength, and defined electrical and thermal conductivity. They are suitable for use as functional coatings in high-stress environments and can be specifically integrated into multilayer systems.

High chemical purity is crucial for reproducible results. It has a significant impact on film growth, microstructure, adhesion, and the functional properties of the film. In the context of research, these relationships are systematically analyzed in order to develop stable and transferable processes. The precursors purified by Gemeinnützige KIMW Forschungs-GmbH have a purity of 99.9%.

The development of coating systems is supported by comprehensive material and surface analysis. This involves examining, among other things, coating thickness, coating structure, chemical composition, topography, hardness, and tribological properties. Based on this information, processes can be specifically optimized and tailored to meet industrial requirements.

Our development process is consistently application- and product-oriented and is carried out in close collaboration with our industry partners. From the initial concept through process development to evaluation under real-world operating conditions, we create solutions that can be directly integrated into existing manufacturing environments and processes.

By using organometallic precursors, the non-profit KIMW Forschungs-GmbH is developing new coating architectures specifically designed to meet very high thermal, mechanical, and tribological requirements. This lays the foundation for high-performance, resource-efficient, and cost-effective tooling solutions.

In semiconductor technology, organometallic precursors such as molybdenum hexacarbonyl (CAS No. 13939-06-5) and tungsten hexacarbonyl (CAS No. 14040-11-0) are frequently used in gas-phase processes, particularly in methods such as chemical vapor deposition (CVD) or related coating technologies. They serve as a metal source for the controlled deposition of thin metallic layers on substrates.

These layers can be used, for example, as conductive contacts, diffusion barriers, or functional interlayers in microelectronic components. Due to their defined chemical structure and good vaporizability, these precursors enable precise process control and reproducible material properties, which are crucial for the fabrication of modern semiconductor structures.

In chemical engineering, organometallic compounds such as molybdenum hexacarbonyl (CAS No. 13939-06-5) and tungsten hexacarbonyl (CAS No. 14040-11-0) are used both for research purposes and in industrial development processes. Among other things, they serve as starting materials for metallic coatings, for the synthesis of metal-containing materials, or as intermediates in the production of special functional materials. Due to their clearly defined chemical properties, these compounds can be specifically integrated into process developments that require reproducible reaction conditions and high material purity.

Organometallic carbonyl compounds are frequently used as starting materials for the production of catalytically active materials. Molybdenum and tungsten compounds play an important role in many industrial catalysts, for example in oxidation, hydrogenation, or reforming reactions. Precursors such as molybdenum hexacarbonyl (CAS No. 13939-06-5) and tungsten hexacarbonyl (CAS No. 14040-11-0) enable the targeted incorporation of these metals into catalytic systems, thereby facilitating the development of high-performance and selective catalysts.

In the petrochemical industry, olefins are key raw materials for the production of numerous plastics and chemical products. Metal-based catalysts play a crucial role in the efficient conversion of feedstocks into olefins. Organometallic precursors such as molybdenum hexacarbonyl (CAS No. 13939-06-5) and tungsten hexacarbonyl (CAS No. 14040-11-0) can be used in the research and development of such catalysts, as they enable the precise introduction of transition metals such as molybdenum or tungsten into catalytic systems. This allows for the development of new catalyst materials and the further optimization of existing processes.

The aerospace industry requires materials that can withstand extreme thermal, mechanical, and chemical stresses. Organometallic precursors can be used to produce highly durable metallic coatings, for example for components with increased requirements for wear resistance, temperature stability, or corrosion protection. Coating processes such as CVD allow precursors like molybdenum hexacarbonyl (CAS No. 13939-06-5) and tungsten hexacarbonyl (CAS No. 14040-11-0) to be used to create thin, uniform metal layers that improve the service life and performance of technical components.

The quality of the organometallic precursors used has a direct impact on the stability and reproducibility of industrial processes. High-purity compounds reduce the risk of undesirable side reactions, enable precise control of coating or synthesis processes, and help ensure consistent material properties. High purity of the starting materials is therefore of central importance, particularly in sensitive areas such as semiconductor manufacturing or catalyst development. The precursors purified by the non-profit KIMW Forschungs-GmbH have a purity of 99.9%.